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Dogan, M., Gong, N., Maae, T.-P. and Ismail-Beigi, S. (2019) Causes of Ferroelectricity in HfO2-Based Thin Films: An Ab Initio Perspective. Physical Chemistry Chemical Physics, 21, 12150-12162.
https://doi.org/10.1039/C9CP01880H

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