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Hou, M., Kharlamov, V.S. and Zhurkin, E.E. (2002) Atomic-Scale Modeling of Cluster-Assembled NixAl1-x Thin Films. Physical Review B, 66, 195408-1.
https://www.researchgate.net/publication/292615815_Processy_formirovania_nanostruktur_pri_
osazdenii_klasterov_Na_poverhnost_kristallov_S_pomosu_komputernogo_modelirovania
https://doi.org/10.1103/PhysRevB.66.195408

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