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Shih, H., Daugherty, J, Huang, T., Outka, D., Chang, C., Fang, Y., Li, S., Xu, L., Avoyan, A., Zhou, C., Hayes, D., Wu, S., Haruff, H., Stevenson, T., Baylon, K., La Croix, C., Ronne, A., Du, Y., O’Nei, G., Casaes, R., Kim, T.W., Vahedi, V. and Gottscho, R. (2012) A Systematic Characterization of Advanced Chamber Materials for Plasma Dry Etching Processes in Semiconductor Wafer Fabrication. 1st Annual World Congress of Advanced Materials, Beijing, 6-8 June 2012, Beijing International Convention Center.

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