Article citationsMore>>

Karunagaran, B., Kumar, R.T., Kumar, V.S., Mangalaraj, D., Narayandass, S.K. and Rao, G.M. (2003) Structural Characterization of DC Magnetron-Sputtered TiO2 Thin Films Using XRD and Raman Scattering Studies. Materials Science in Semiconductor Processing, 6, 547-550.
https://doi.org/10.1016/j.mssp.2003.05.012

has been cited by the following article:

• TITLE: Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering

  AUTHORS: Wichai Kongsri, Supanee Limsuwan, Surasing Chaiyakun, Pichet Limsuwan, Chittra Kedkaew

  KEYWORDS: TiO2, Magnetron Sputtering, Rutile

  JOURNAL NAME: Materials Sciences and Applications, Vol.10 No.3, March 25, 2019

  ABSTRACT: In this work, structural and optical properties of the TiO2 films deposited on unheated substrates by dual cathode dc unbalanced magnetron sputtering at long substrate-target distance (ds-t) were studied. Titanium dioxide (TiO2) thin films were deposited on unheated Si (110) wafers, glass slides and carbon coated copper grids at different substrate to target (ds-t) distances. The structural properties of TiO2 thin films were characterized by X-ray diffraction (XRD) and transmission electron microcopy (TEM) with selected-area electron diffraction (SAED), surface morphology using atomic force microscopy (AFM) and optical transmission spectra using a spectrophotometer. XRD results show that TiO2 films deposited at various ds-t distances have only rutile crystal structure. The crystallinity and thickness of the films increased while the roughness decreased with decreasing ds-t distance. The refractive indices of the deposited films were found to be in the range of 2.51 - 2.82 and increased with decreasing ds-t distance.