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K. M. Monahan, “Enabling Double Patterning at the 32 nm Node,” IEEE International Symposium on Semiconductor Manufacturing, Tokyo, 25-27 September 2006, pp. 126-129. doi:10.1109/ISSM.2006.4493040

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• TITLE: Synthesis of Sn-3.5Ag Alloy Nanosolder by Chemical Reduction Method

  AUTHORS: Hsin Jen Pan, Chao Yang Lin, Udit Surya Mohanty, Jung Hua Chou

  KEYWORDS: Alloy, Agglomeration, Nanoparticles, Chemical Reduction, Morphology, X-Ray Diffraction

  JOURNAL NAME: Materials Sciences and Applications, Vol.2 No.10, October 17, 2011

  ABSTRACT: The synthesis of Sn-3.5Ag alloy nanosolder was investigated by chemical reduction method. In this method, chemical precipitation was achieved by using sodium NaBH4 as a reducing agent and PVP (poly-m-vinyl 2- pyrrolidone) as a stabilizer. The experimental results obtained with different amounts of NaBH4 and PVP were compared. X-ray diffraction (XRD) patterns revealed that Ag3Sn was formed due to the successful alloying process. Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) demonstrated a change in the morphology of Sn-3.5 Ag alloy nanosolder with increase in the PVP content in the bath. The size of the nanoparticles ranged from 300 to 700 nm. The nanosolder/nanoparticles were thus synthesized successfully under controlled and optimized chemical reduction process.