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Temple Boyer, P., Rossi, C., Saint Etienne, E. and Scheid, E. (1998) Residual Stress in Low Pressure Chemical Vaport Deposition SiNx Films Deposited from Silane and Ammonia. Journal of Vacuum Science & Technology, 16, 2003-2337.
https://doi.org/10.1116/1.581302

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