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Gaiseanu, F., Tsoukalas, D., Esteve, J., Postolache, C., Goustouridis, D. and Tsoi, E. (1997) Chemical Etching Control during the Self-Limitation Process by Boron Diffusion in Silicon: Analytical Results. International Semiconductor Conference 20th Edition, Sinaia, 7-11 October 1997, 247-250.

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