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Rahman, M.K., Nemouchi, F., Chevolleau, T., Gergaud, P. and Yakache, K. (2017) Ni and Ti Silicide Oxidation for CMOS Applications Investigated by XRD, XPS and FPP. Materials Science in Semiconductor Processing, 71, 470-476.
https://doi.org/10.1016/j.mssp.2017.06.025

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