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Hu, T., Steihl, L., Rafaniello, W., Fawcett, T., Hawn, D.D., Mashall, J.G., Rozeveld, S.J., Putzig, C.L., Blackson, J.H., Cermignani, W. and Robinson, M.G. (1998) Structures and Properties of Disordered Boron Carbide Coatings Generated by Magnetron Sputtering. Thin Solid Films, 332, 80-86.
https://doi.org/10.1016/S0040-6090(98)01019-0

has been cited by the following article:

• TITLE: Tribological Behavior of Binary B-C Films Deposited by Sputtering-PBII Hybrid System

  AUTHORS: Honei Chin, Satoshi Yoshida, Shuichi Watanabe

  KEYWORDS: Binary Boron-Carbon (B-C) Film, Sputtering, Plasma-Based Ion Implantation (PBII), Hybrid System, Bonding Structure, Friction Performance

  JOURNAL NAME: Materials Sciences and Applications, Vol.9 No.9, August 7, 2018

  ABSTRACT: In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron carbide (99.5%) disk was used as a target with an RF power of 300 W. The mixtures of Argon (Ar)-Methane (CH4) ware used as reactive gas under varying CH4 partial flow pressure at the specified range of 0 - 0.15 Pa and fixed total gas pressure and total gas flow at 0.30 Pa and 30 sccm, respectively. The effect of CH4 flow ratio on the friction coefficient of B-C films was studied. The friction coefficient of the film depended on the concentration of B. When it was 10% or lower, the coefficient decreased to 0.2 or lower. In this concentration range of B, the specific wear rate also decreased to the order of 10-7 mm3/Nm, and excellent wear resistance was displayed.