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Yamanaka, J., Shirakura, M., Yamamoto, C., Utsuyama, N., Sato, K., Yamada, T., Hara, K.O., Arimoto, K. and Nakagawa, K. (2018) Surface Roughness of SiGe/Si (110) Formed by Stress-Induced Twins and the Solution to Produce Smooth Surface. Journal of Materials Science and Chemical Engineering, 6, 25-31. https://doi.org/10.4236/msce.2018.61004

has been cited by the following article:

• TITLE: Feasibility Study to Evaluate Lattice-Space Changing of a Step-Graded SiGe/Si (110) Using STEM Moiré

  AUTHORS: Junji Yamanaka, Mai Shirakura, Chiaya Yamamoto, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, Kazuo Ishizuka

  KEYWORDS: STEM Moiré, SiGe, Scanning Transmission Electron Microscopy

  JOURNAL NAME: Journal of Materials Science and Chemical Engineering, Vol.6 No.7, July 4, 2018

  ABSTRACT: A moiré between crystal lattice planes and scanning electron beam-lines formed in a scanning transmission electron microscope includes the information of the lattice spacing. We apply these phenomena to a compositionally graded SiGe thin film deposited onto a Si substrate by molecular beam epitaxy method. The results of the experiments and image analysis show the potential of this technique to analyze a slight change of the lattice spacing according to a compositional change.