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Arimoto, K., Watanabe, M., Yamanaka, J., Nakagawa, K., Sawano, K., Shiraki, Y., Usami, N. and Nakajima, K. (2009) Crystalline Morphologies of Step-Graded SiGe Layers Grown on Ex-Act and Vicinal (110) Si Substrates. J. Cryst. Growth, 311, 809-813. https://doi.org/10.1016/j.jcrysgro.2008.09.061

has been cited by the following article:

• TITLE: Feasibility Study to Evaluate Lattice-Space Changing of a Step-Graded SiGe/Si (110) Using STEM Moiré

  AUTHORS: Junji Yamanaka, Mai Shirakura, Chiaya Yamamoto, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, Kazuo Ishizuka

  KEYWORDS: STEM Moiré, SiGe, Scanning Transmission Electron Microscopy

  JOURNAL NAME: Journal of Materials Science and Chemical Engineering, Vol.6 No.7, July 4, 2018

  ABSTRACT: A moiré between crystal lattice planes and scanning electron beam-lines formed in a scanning transmission electron microscope includes the information of the lattice spacing. We apply these phenomena to a compositionally graded SiGe thin film deposited onto a Si substrate by molecular beam epitaxy method. The results of the experiments and image analysis show the potential of this technique to analyze a slight change of the lattice spacing according to a compositional change.