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B. Sun, Y. Chen, P. Zhou, C. H. Xu, Y. F. Kong, Y. X. Zheng and L. Y. Chen, “Ellipsometric Study of the Optical Properties of Silicon-Based Si:SiO2 Composite Thin Films under Different Annealing Temperatures,” The Korean Physical Society, Vol. 49, No. 95, 2006, pp. 2184-2187.

has been cited by the following article:

• TITLE: Thin Film Characterization Using Rotating Polarizer Analyzer Ellipsometer with a Speed Ratio 1:3

  AUTHORS: Sofyan A. Taya, Taher M. El-Agez, Anas A. Alkanoo

  KEYWORDS: Ellipsometry, Rotating Polarizer-Analyzer Ellipsometer, Thin Film Characterization, Optical Constants, C-Si, SiO2

  JOURNAL NAME: Journal of Electromagnetic Analysis and Applications, Vol.3 No.9, September 28, 2011

  ABSTRACT: In a recent previous work, we proposed a rotating polarizer-analyzer ellipsometer (RPAE) in which the two elements are rotating synchronously in the same direction with a speed ratio 1:3. We applied this technique to bulk samples. In this work, we present theoretically the characterization of 100 nm SiO2 thin film using this spectroscopic RPAE. We assume a structure consisting of air (ambient)/SiO2 (thin film)/c-Si (substrate). The ellipsometric parameters ψ and Δ are calculated when a clean signal is received by the detector and when a hypothetical noise is imposed on this signal. The film thickness and the optical constants of the film are calculated for the noisy signal in the spectrum range 200 - 800 nm. The results are compared with the proposed thickness and with the accepted values for SiO2 optical constants.