TITLE:
Laser Produced Plasma X-Ray Sources for Nanoscale Resolution Contact Microscopy: A Candidate in Cancerous Stem Cells Imaging
AUTHORS:
Yas Al-Hadeethi, A. Al-Mujtabi, Fahd M. Al-Marzouki
KEYWORDS:
Laser Plasmas, Contact Microscopy, Laser Ablation, Water Window X-Rays, PMMA Photoresist, Mass Ablation Rate, Exposure Depth
JOURNAL NAME:
Advances in Molecular Imaging,
Vol.7 No.4,
November
29,
2017
ABSTRACT: Plasma X-ray sources for biological microscopy have been produced by focusing single shots from Nd:glass laser onto carbon rod targets at irradiances between 1 × 1013 W⋅cm−2 and 3 × 1013 W⋅cm−2 to expose test objects. The optimum parameters needed for obtaining high accurate information on the samples under test namely: the minimum energies and irradiances at a range of angles between the incoming laser beam and the normal to the resist, the depth of exposure of the photoresist as a function of incident laser energy (and irradiance) were concluded in this work.