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A. Srivastava, P. Sarkar and C. K. Sarkar, “Study of Gate Dielectric Permittivity Variation with Different Equivalent Oxide Thickness on Channel Engineered Deep Sub-micrometer N-MOSFET Device for Mixed Signal Applications,” Microelectronics Reliability, Vol. 49, No. 4, April 2009, pp. 365-370.

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