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Cadieu, F.J., Vander, I., Rong, Y. and Zuneska, R.W. (2012) X-Ray Measurements of Nanometer-Thick Tantalum Oxide and Hafnium Oxide Films on Silicon Substrates for Thickness and Composition Determination. Powder Diffraction, 27, 87-91.
https://doi.org/10.1017/S0885715612000425

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