TITLE:
Preparation of Cr2O3-Ta2O5 Composites Using RF Magnetron Sputtering
AUTHORS:
Kenta Miura, Takumi Osawa, Yuya Yokota, Osamu Hanaizumi
KEYWORDS:
Ta2O5, Cr2O3, Co-Sputtering, X-Ray Diffraction, Photoluminescence
JOURNAL NAME:
Open Access Library Journal,
Vol.2 No.12,
December
14,
2015
ABSTRACT: We prepared Cr2O3-Ta2O5 composite films using our RF magnetron co-sputtering method for the first time.
X-ray diffraction (XRD) patterns and photoluminescence (PL) spectra of the
films annealed at 700℃, 800℃, 900℃, and 1000℃ were evaluated. From their XRD
patterns, the Cr2O3-Ta2O5 film
annealed at 700℃ seemed to be
almost amorphous, and the one annealed at 800℃ seemed to be hexagonal Ta2O5 doped with Cr. In
addition, the Cr2O3-Ta2O5 films
annealed at 900℃ and 1000℃ seemed to include tetragonal CrTaO4 phases. Furthermore, it
seems that almost no defect exists in our Cr2O3-Ta2O5 composite films annealed at 700℃ - 1000℃ because their PL spectra have no
defect-related peak. We thus find that good-qualityCr2O3-Ta2O5 composite films including CrTaO4 canbe obtained
using our very simple co-sputtering method and subsequent annealing above
900℃.