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Sang, J., Ha, J.S., Park, N.K., Kang, D.K. and Kim, B.-H. (2006) 5 nm Thick Lanthanum Oxide Thin Films Grown on Si(100) by Atomic Layer Deposition: The Effect of Post-Annealing on the Electrical Properties. Thin Solid Films, 513, 253-257.
http://dx.doi.org/10.1016/j.tsf.2006.01.008

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