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Savvides, N., Alister, S.P., Hurd, C.M. and Shiozaki, I. (1982) Localization in the Metallic Regime of Granular Cu- SiO2 Films. Solid State Communications, 42, 143-145. http://dx.doi.org/10.1016/0038-1098(82)90370-2

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