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Olubuyide, O., Danielson, D., Kimerling, L. and Hoyt, J. (2006) Impact of Seed Layer on Material Quality of Epitaxial Germanium on Silicon Deposited by Low Pressure Chemical Vapor Deposition. Thin Solid Films, 508, 14-19.
http://dx.doi.org/10.1016/j.tsf.2005.06.120

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