TITLE:
Structural and Surface Morphology Analysis of Copper Phthalocyanine Thin Film Prepared by Pulsed Laser Deposition and Thermal Evaporation Techniques
AUTHORS:
Mohammed T. Hussein, Kadhim A. Aadim, Eman K. Hassan
KEYWORDS:
Organic CuPc, Pulse Laser Deposition, XRD, EDX, AFM, Morphology
JOURNAL NAME:
Advances in Materials Physics and Chemistry,
Vol.6 No.4,
April
19,
2016
ABSTRACT: In the present
paper, Copper Phthalocyanine (CuPc) thin films were deposited on glass and silicon
substrate by thermal evaporation and pulsed laser deposition (PLD) methods.
CuPc thin films prepared at different annealing temperatures (298, 323, 348,
373, 423 K) respectively. The structure and surface morphology of CuPc in
powder and thin films forms prepared by two methods were studied using Energy
dispersive X-ray (EDX), X-ray florescence
(XRF), X-ray diffraction (XRD), Atomic force microscope (AFM), and
Scanning electron microscope (SEM). It showed that there was a change and enhancement
in the crystallinity and surface morphology due to change in the annealing
temperature (Ta). The purpose of our work is to find the optimal
temperature for which the film produces best structural properties for CuPc
thin film to produce organic field effect transistor. Analysis of X-ray
diffraction patterns of CuPc in powder form showed that it had an α-poly-crystalline
phase with monoclinic structure, with preferentially oriented (100) plane
transform to β-single crystalline
morestable structure at different annealing temperatures.