TITLE:
Surface Mapping of Resistive Switching CrOx Thin Films
AUTHORS:
Kim Ngoc Pham, Kieu Hanh Thi Ta, Lien Thuong Thi Nguyen, Vinh Cao Tran, Bach Thang Phan
KEYWORDS:
Resistive Switching, Chromium Oxide, C-AFM, Surface Mapping, Metal Filament
JOURNAL NAME:
Advances in Materials Physics and Chemistry,
Vol.6 No.3,
March
11,
2016
ABSTRACT: In
this work, we investigated resistive switching behavior of CrOx thin
films grown by using sputtering technique.
Conventional I-V measurements obtained from Ag/CrOx/Pt/Ti/SiO2/Si
structures depict the bipolar switching behavior, which is controlled by
formation/dissolution processes of Ag conducting filaments through electrochemical
redox reaction under external electric field driven. Conductive atomic force
microscopy (C-AFM) technique provides the valuable mapping images of existing
Ag filaments at low resistance state as well as the characteristics of filament
distributions and diameters. This study also reveals that where the higher
amplitude of topography is, the easier possibility of forming conducting
filament paths is on CrOx surface films.