TITLE:
Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System
AUTHORS:
Bahaa T. Chiad, Mohammad K. Khalaf, Firas J. Kadhim, Oday A. Hammadi
KEYWORDS:
Physical Vapor Deposition, Sputtering, Magnetron Sputtering, Paschen’s Law
JOURNAL NAME:
Open Access Library Journal,
Vol.1 No.4,
July
23,
2014
ABSTRACT: In this work, a home-made closed-field unbalanced magnetron system for plasma sputtering purposes was constructed and operated. The effect of magnetron was introduced by comparing the obtained Paschen’s curve in existence of magnetron with and without magnetron. Characterization of Paschen’s curve as well as discharge current with gas pressure at different distances between the discharge electrodes was introduced. Optimum conditions to operate such home-made system for sputtering purpose were determined.