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Rademacher, D., Zickenrott, T. and Vergöhl, M. (2013) Sputtering of Dielectric Single Layers by Metallic Mode Reactive Sputtering and Conventional Reactive Sputtering from Cylindrical Cathodes in a Sputter-Up Configuration. Thin Solid Films, 532, 98-105.
http://dx.doi.org/10.1016/j.tsf.2012.11.101

has been cited by the following article:

• TITLE: Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System

  AUTHORS: Bahaa T. Chiad, Mohammad K. Khalaf, Firas J. Kadhim, Oday A. Hammadi

  KEYWORDS: Physical Vapor Deposition, Sputtering, Magnetron Sputtering, Paschen’s Law

  JOURNAL NAME: Open Access Library Journal, Vol.1 No.4, July 23, 2014

  ABSTRACT: In this work, a home-made closed-field unbalanced magnetron system for plasma sputtering purposes was constructed and operated. The effect of magnetron was introduced by comparing the obtained Paschen’s curve in existence of magnetron with and without magnetron. Characterization of Paschen’s curve as well as discharge current with gas pressure at different distances between the discharge electrodes was introduced. Optimum conditions to operate such home-made system for sputtering purpose were determined.