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Yu, X.F., Li, Y.X., Ge, W., Yang, Q., Zhu, N.F. and Kalantar-zadeh, K. (2006) Formation of Nanoporous Titanium Oxide Films on Silicon Substrates Using an Anodization Process. Nanotechnology, 17, 808-814.
http://dx.doi.org/10.1088/0957-4484/17/3/033

has been cited by the following article:

• TITLE: Formation of TiO2 Nanopores by Anodization of Ti-Films

  AUTHORS: Patricia M. Perillo, Daniel F. Rodríguez

  KEYWORDS: RF Magnetron Sputtering, TiO2, Nanopores, Anodic Oxidation

  JOURNAL NAME: Open Access Library Journal, Vol.1 No.3, June 19, 2014

  ABSTRACT: Titania nanopores were fabricated on silicon substrate. Ti thin films (600 nm) were first deposited by radio-frequency (RF) magnetron sputtering at two substrate temperatures and then anodized in glycerol electrolytes containing NH4F. The morphology and structure were identified by means of scanning electron microscopy (SEM), X-ray diffractometry (XRD). The effect of the temperature on the Ti thin films deposited by RF magnetron sputtering and the applied voltage on nanopore morphology were investigated. Homogeneously distributed nanopores with dimensions in the range of 60 to 80 nm were obtained independently of the voltage applied during the anodization and the substrate temperature in sputtering deposition.