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Habuka, H., Tanaka, K., Katsumi, Y., Takechi, N., Fukae, K. and Kato, T. (2010) 4H-SiC Surface Morphology Etched Using ClF3 Gas. Material Science Forum, 645-648, 787-790.
http://dx.doi.org/10.4028/www.scientific.net/MSF.645-648.787

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