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Habuka, H., Tanaka, K., Katsumi, Y., Takechi, N., Fukae, K. and Kato, T. (2009) 4H-Silicon Carbide Surface Morphology Etched Using Chlorine Trifluoride Gas. Journal of the Electrochemical Society, 156, H971-H975.
http://dx.doi.org/10.1149/1.3243878

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