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Zheng, S., Kawashima, M., Mori, M., Tambo, M. and Tatsuyama, T. (2006) Interdiffusion at Si/SiGe Interface Analyzed by High-Resolution X-Ray Diffraction. Thin Solid Layers, 508, 156-159. http://dx.doi.org/10.1016/j.tsf.2005.08.416

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