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Shim, K.-H., Yang, H.D. and Kil, Y.-H. (2013) Characterization of Reduced Pressure Chemical Vapor Deposited Si0.8Ge0.2/Si Multi-Layers. Materials Science in Semiconductor Processing, 16, 126-130. http://dx.doi.org/10.1016/j.mssp.2012.06.002

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