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Lemberger, M., Thiemann, S., Baunemann, A., Parala, H., Fischer, R.A., Hinz, J., Bauer, A.J. and Ryssel, H. (2007) MOCVD of Tantalum Nitride Thin Films from TBTEMT Single Source Precursor as Metal Electrodes in CMOS Applications. Surface and Coatings Technology, 201, 9154-9158. http://dx.doi.org/10.1016/j.surfcoat.2007.04.074

has been cited by the following article:

• TITLE: Dry Sliding Wear Behavior of Ti6Al4V and TaN against TiN Deposited Steel Surface

  AUTHORS: A. Elaya Perumal, I. Saravanan

  KEYWORDS: TiN, Ti6Al4V, Dry Sliding Wear, TaN

  JOURNAL NAME: Journal of Materials Science and Chemical Engineering, Vol.3 No.7, July 16, 2015

  ABSTRACT: The objective of this research is to study the dry sliding wear behaviour of metal surfaces and influences of their surface hardness. The improved hardness of the TiN deposited surface was about 1763 Hv. The worn surface Scanning Electron Microscope (SEM) morphology exhibits the surface damage due to varying wear test parameters. The Electron Dispersive Spectroscopy (EDS) reveals that the material transfer between the counter parts and the wear mechanism has been involved. The minimum specific wear rate of TiN surface was 0.0018 mg/Nm and 0.0026 mg/Nm against Ti6Al4V alloy and TaN respectively.