Article citationsMore>>

Jing, S.-Y. and Lee, H.-J. (2002) Chemical Bond Structure on Si-O-C Composite Films with a Low Dielectric Constant Deposited by Using Inductively Coupled Plasma Chemical Vapor Deposition. Journal of the Korean Physical Society, 41, 769-773.

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top