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Awaya, N., Inokawa, H., Yamamoto, E., Okazaki, Y., Miyake, M., Arita, Y. and Kobayashi, T. (1996) Evaluation of a Copper Metallization Process and the Electrical Characteristics of Copper-Interconnected Quarter-Micron CMOS. IEEE Transactions on Electron Devices, 43, 1206-1212.
http://dx.doi.org/10.1109/16.506770

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