Article citationsMore>>

Miller, R.D., Wallraff, G.M., Clecak, N., Sooriyakumaran, R., Michl, J., Karatsu, T., McKinley, A.J., Klingensmith, K.A. and Downing, J. (1989) Polysilanes: Solution Photochemistry and Deep UV Lithography. Polymer Materials Science Engineering, 60, 49.
http://dx.doi.org/10.1021/bk-1989-0412.ch008

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top