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Miller, R.D., Willson, C.G., Wallraff, G.M., Clecak, N., Sooriyakumaran, R., Michl, J., Karatsu, T., McKinley, A.J., Klingensmith, K.A. and Downing, J. (1989) Polysilanes: Photochemistry and Deep UV Lithography. Polymer Engineering Science, 29, 882-886.
http://dx.doi.org/10.1002/pen.760291311

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