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Kada, T., Ishikawa, M., Machida, H., Ogura, A., Ohshita, Y. and Soai, K. (2005) Volatile CVD Precursor for Ni Film: Cyclopentadienylallylnickel. Journal of Crystal Growth, 275, e1115-e1119.
http://dx.doi.org/10.1016/j.jcrysgro.2004.11.198

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