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Hung, H., Caulfield, J.P and Shan, H. (2003) Process for Etching Oxide Using Heafluorobutadiene or Related Fluorocarbons and Manifesting a Wide Process Window. US6602434.

has been cited by the following article:

• TITLE: The Research Progress of Hexafluorobutadiene Synthesis

  AUTHORS: Jing Zhu, Shuang Chen, Baohe Wang, Xiaorong Zhang

  KEYWORDS: Perfluorobutadiene, Synthesis, Diiodoperfluoroalkanes, Trifluoromonochloroethylene, Tetrafluoroethylene, 1, 2-Difluoro-1’, 2’-dichloroethylene

  JOURNAL NAME: International Journal of Organic Chemistry, Vol.4 No.5, December 31, 2014

  ABSTRACT: Hexafluorobutadiene is a new plasma etching gas for semiconductor molectron which has perfect properties and also is a preceding monomer that can be used for synthesizing many fluorinated compounds. This paper described the different synthesis methods of perflurobutadiene from different materials, and contrasted the characteristic of each synthetic method. The route from tetrafluoroethylene has more industrialization prospects.