Article citationsMore>>

Krebs, H.-U., Weisheit, M., Faupel, J., Süske, E., Scharf, T., Fuhse, C., Buback, M., et al. (2003) Pulsed Laser Deposition (PLD)—A Versatile Thin Film Technique. In: Kramer, B., Ed., Advances in Solid State Physics, Vol. 43, Springer, Berlin Heidelberg, 505-518.

has been cited by the following article:

• TITLE: Comparison on Morphological and Optical Properties of TiO2 Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

  AUTHORS: Yonic Peñaloza-Mendoza, Luis Ponce-Cabrera

  KEYWORDS: Pulsed Laser Deposition, Single-Pulse Ablation, Multi-Pulse Ablation, TiO2 Thin Film

  JOURNAL NAME: Journal of Surface Engineered Materials and Advanced Technology, Vol.5 No.1, December 26, 2014

  ABSTRACT: TiO2 thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.