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C.C. Lin and S.Y. Chen, “Properties of nitrogen-implanted p-type ZnO films grown Si3N4/Si by radio-frequency magnetron sputtering”, Appl. Phys. Lett. Vol. 84, 2004, pp.5040.

has been cited by the following article:

• TITLE: Growth Mechanism of Zno Films Deposited by Spray Pyrolysis Technique

  AUTHORS: Bhavana Godbole, Nitu Badera, Shyambihari Shrivastava, Deepti Jain, Vganesan Ganesan

  KEYWORDS: Nano-Crystalline Materials, Thin Film, Atomic Force Microscope, Structure and Morphology, Thickness

  JOURNAL NAME: Materials Sciences and Applications, Vol.2 No.6, June 24, 2011

  ABSTRACT: Transparent Zinc Oxide (ZnO) thin films having different thickness are prepared by using spray pyrolysis technique. Structural and morphological behavior has been studied by using atomic force microscopy and x-ray diffraction. The scaling behavior obtained by using height-height correlation method shows that, films with different thickness are developed under non-equilibrium condition behaves as self-affine surfaces. With the increase in thickness, the grain size as well as activation energy have found to be decreased.