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Kimmle, C., Wolff, S., Doering, C. and Fouckhardt, H. (2013) Dependence of Fused-Silica Etch Rate on the Etch Mask Opening Diameter. Microelectronic Engineering, 112, 10-13.
http://dx.doi.org/10.1016/j.mee.2013.05.006

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