TITLE:
Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature
AUTHORS:
Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu
KEYWORDS:
PCVD; Amorphous Titanium-Oxide; FTIR; Hydroxyl; Hydrophilicity
JOURNAL NAME:
Journal of Crystallization Process and Technology,
Vol.4 No.1,
January
8,
2014
ABSTRACT: Plasma-assisted chemical vapor deposition (PCVD)
at pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma
generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at
temperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated
that density of OH group in the amorphous layer was related to the density of
OH or H2O in the plasma and the species was formed on electrode to
induce the RF-power. Hydrophilicity on the layer was dependent on the density
of chemisorbed OH, but was
degraded by the excess OH. The PCVD-TiOx coating was demonstrated
on polyethylene terephthalate and showed good hydrophilic property with the
contact angle of water about 5°.