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M. Rossi and D. J. Eckstrom, “Quantitative Aspects of Benzene Photoionization at 248 nm,” Chemical Physics Letters, Vol. 120, No. 2, 1985, pp. 118 123. http://dx.doi.org/10.1016/0009-2614(85)87025-1

has been cited by the following article:

• TITLE: Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor

  AUTHORS: Simon Kibben

  KEYWORDS: Local Surface Halogenation; Polymer Modification; UV-Laser-Based Surface Modification

  JOURNAL NAME: Modeling and Numerical Simulation of Material Science, Vol.4 No.1, January 7, 2014

  ABSTRACT: An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.