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S. Zhu, R. L. Van Meirhaeghe, S. Forment, G. P. Ru, X. P. Qu and B. Z. Li, “Schottky Barrier Characteristics of Ternary Silicide Co1?xNixSi2 on n-Si(100) Contacts Formed by Solid Phase Reaction of Multilayer,” Solid- State Electronics, Vol. 48, No. 7, July 2004, pp. 1205- 1209.

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