TITLE:
Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine
AUTHORS:
Jung-Dae Cho, Dong-Pyo Kim, Jin-Who Hong
KEYWORDS:
Fluoropolymer; Photocuring Behaviors; Oxygen Inhibition; Photosynergist
JOURNAL NAME:
Open Journal of Organic Polymer Materials,
Vol.4 No.1,
December
27,
2013
ABSTRACT: UV-curable
perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and
the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary
triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen
atmospheres. Photo-DSC analysis revealed that N2 purging and the presence
of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable
free-radical PFPE-DMA/ HDDA
system. In addition, TEA synergistically acted as a coinitiator or
photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for
the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The
results presented here demonstrate that investigating the photocuring behaviors
of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA
fluoropolymer.