Article citationsMore>>

H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger and P. Renaud, “High-Aspect-Ratio, Ultrathick, Negative-Tone Near-UV Photoresist and Its Applications for MEMS,” Sensors and Actuators A: Physical, Vol. 64, No. 1, 1998, pp. 33-39.
http://dx.doi.org/10.1016/S0924-4247(98)80055-1

has been cited by the following article:

• TITLE: Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine

  AUTHORS: Jung-Dae Cho, Dong-Pyo Kim, Jin-Who Hong

  KEYWORDS: Fluoropolymer; Photocuring Behaviors; Oxygen Inhibition; Photosynergist

  JOURNAL NAME: Open Journal of Organic Polymer Materials, Vol.4 No.1, December 27, 2013

  ABSTRACT: UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.