Introduction of a New Baffle-Plate Concept to Control the Gas Flow Behavior in a Large Volume PECVD Chamber

ISSN Print: 2165-3852
ISSN Online: 2165-3860
www.scirp.net/journal/ojfd
E-mail: [email protected]

Citations

"Introduction of a New Baffle-Plate Concept to Control the Gas Flow Behavior in a Large Volume PECVD Chamber"
written by Gustavo Simiema de Freitas Barbosa, Klaus Vissing, Bernd Mayer,
published by Open Journal of Fluid Dynamics, Vol.8 No.2, 2018

has been cited by the following article(s):

[1]	Ferris-wheel-assisted parylene-C dielectric deposition for improving organic thin-film transistor uniformity
	Flexible and Printed …, 2022

[2]	New insight into organosilicon plasma‐enhanced chemical vapor deposition layers and their crosslinking behavior by calculating the degree of Si‐networking
	Plasma Processes and Polymers, 2019

[1]	Gas baffle optimization for CF4 plasma uniformity in inductively coupled plasma etching: numerical simulations Plasma Science and Technology, 2025 DOI:10.1088/2058-6272/addc1a

[2]	Ferris-wheel-assisted parylene-C dielectric deposition for improving organic thin-film transistor uniformity Flexible and Printed Electronics, 2022 DOI:10.1088/2058-8585/ac6b6c

[3]	New insight into organosilicon plasma‐enhanced chemical vapor deposition layers and their crosslinking behavior by calculating the degree of Si‐networking Plasma Processes and Polymers, 2020 DOI:10.1002/ppap.201900202