Characteristics of a Silicon Wafer <111> and <004> after Planting Nitrogen

ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.net/journal/ampc
E-mail: [email protected]

Citations

"Characteristics of a Silicon Wafer <111> and <004> after Planting Nitrogen"
written by Mehdi Simiari, Ramin Roozehdar Mogaddam,
published by Advances in Materials Physics and Chemistry, Vol.7 No.5, 2017

has been cited by the following article(s):

[1]	Surface Treatments and Modifications of Si Wafers Produced by Czochralski Method for Solar Cell Applications
	2019

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