Advances in Materials Physics and Chemistry

Advances in Materials Physics and Chemistry

ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.net/journal/ampc
E-mail: [email protected]
"One-Step Seedless and Catalyst—Free Growth of Hierarchical ZnO Film Promising for Photoelectrochemical Application"
written by Jie Wang, Lei Pan, Hua Meng, Ruqu Han, Zhipeng Huang, Chi Zhang,
published by Advances in Materials Physics and Chemistry, Vol.6 No.3, 2016
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