Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus

ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.net/journal/ampc
E-mail: [email protected]

Citations

"Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus"
written by V. N. Demin, V. O. Borisov, G. N. Grachev, A. L. Smirnov, M. N. Khomyakov, S. N. Bagayev,
published by Advances in Materials Physics and Chemistry, Vol.11 No.7, 2021

has been cited by the following article(s):

[1]	ГОМОГЕННОЕ ЗАРОДЫШЕОБРАЗОВАНИЕ ПРИ ЛАЗЕРНО-ПЛАЗМОХИМИЧЕСКОМ СИНТЕЗЕ ТВЕРДЫХ ПОКРЫТИЙ SICN ИЗ ГЕКСАМЕТИЛДИСИЛАЗАНА
	ЖУРНАЛ …, 2023

[1]	Laser Plasma-Chemical Deposition of Hafnia-Doped Solid Silicon Carbonitride Coatings Journal of Structural Chemistry, 2025 DOI:10.1134/S0022476625050051