Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus

ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.net/journal/ampc
E-mail: [email protected]

Citations

"Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus"
written by V. N. Demin, V. O. Borisov, G. N. Grachev, A. L. Smirnov, M. N. Khomyakov, S. N. Bagayev,
published by Advances in Materials Physics and Chemistry, Vol.11 No.7, 2021

has been cited by the following article(s):

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	ЖУРНАЛ …, 2023

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[2]	Influence of Scanning Patterns on Mechanical Behavior and Distortion in Laser Directed Energy Deposition Journal of Applied Mathematics and Physics, 2024 DOI:10.4236/jamp.2024.1211231

[3]	Boron-Silicon Thin Film Formation Using a Slim Vertical Chemical Vapor Deposition Reactor Advances in Chemical Engineering and Science, 2023 DOI:10.4236/aces.2023.131002