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World Journal of Nano Science and Engineering
Submission
World Journal of Nano Science and Engineering
ISSN Print:
2161-4954
ISSN Online:
2161-4962
www.scirp.net/journal/wjnse
E-mail:
[email protected]
Google-based Impact Factor:
0.57
Citations
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"
Study of Timing Characteristics of NOT Gate Transistor Level Circuit Implemented Using Nano-MOSFET by Analyzing Sub-Band Potential Energy Profile and Current-Voltage Characteristic of Quasi-Ballistic Transport
"
written by
Chek Yee Ooi, Soo King Lim
,
published by
World Journal of Nano Science and Engineering
,
Vol.6 No.4, 2016
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
Numerical Analysis Study of The Effects of Backscattering Coefficient on Electrical Performance of Double-Gate nano-MOSFET
Platform: A Journal of Science and Technology
,
2023
[2]
Comparative Analysis of the Drain Current in a 7nm and 14nm Fully Depleted Silicon-On-Insulator
SLU Journal of Science …
,
2022
[3]
Effect of Temperature on the Quasi Ballistic Transport of a Double Gate NanoMOSFET
Journal of Science …
,
2021
[4]
DEVICE AND CIRCUIT LEVEL SIMULATION STUDY OF NOR GATE LOGIC FAMILIES DESIGNED USING NANO-MOSFETs
2021
[5]
Effect of Temperature on the Quasi Ballistic Transport of a Double Gate Nano-MOSFET
2021
[6]
A flexibility and accuracy comparison study of different current-voltage equations for double-gate nano-MOSFET by simulation and theory
Applications of Modelling and Simulation
,
2021
[7]
Investigation of the Thermal Effect in Nano Silicon on Insulator (SOI) MOSFET
NIPES Journal of …
,
2021
[8]
Comparative Analysis of the Drain Current in a 7nm and 14nm Fully Depleted Silicon-On-Insulator (SOI) MOSFET
No relevant information.
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