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Advances in Chemical Engineering and Science

Advances in Chemical Engineering and Science

Advances in Chemical Engineering and Science

ISSN Print: 2160-0392
ISSN Online: 2160-0406
www.scirp.net/journal/aces
E-mail: [email protected]
"Boron-Silicon Thin Film Formation Using a Slim Vertical Chemical Vapor Deposition Reactor"
written by Yuki Kamochi, Atsuhiro Motomiya, Hitoshi Habuka, Yuuki Ishida, Shin-Ichi Ikeda, Shiro Hara,
published by Advances in Chemical Engineering and Science, Vol.13 No.1, 2023
has been cited by the following article(s):
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