Electrochemical and Photoelectrochemical Properties of Nano-Islands of Zinc and Niobium Oxides Deposited on Aluminum Thin Film by RF Magnetron Reactive Sputtering

ISSN Print: 2153-117X
ISSN Online: 2153-1188
www.scirp.net/journal/msa
E-mail: [email protected]

Citations

"Electrochemical and Photoelectrochemical Properties of Nano-Islands of Zinc and Niobium Oxides Deposited on Aluminum Thin Film by RF Magnetron Reactive Sputtering"
written by Go Sajiki, Yasuhiko Benino, Tokuro Nanba, Hiroshi Okano,
published by Materials Sciences and Applications, Vol.6 No.4, 2015

has been cited by the following article(s):

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[3]	O/Nb= 2.5, 2.6, 2.7 の組成を有する非晶質酸化ニオブ薄膜を利用した光電気化学特性と同薄膜の構造解析
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[4]	Electrochemical Performance of Nanocrystalline Vanadium Pentoxide Thin Films Grown by RF Magnetron Sputtering
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[5]	放射光を利用した非晶質酸化ニオブ薄膜の構造解析
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[6]	Structural analyses and reverse Monte Carlo modeling of niobium oxide amorphous film prepared by sputtering method
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[7]	Investigation of electronic structure of amorphous niobium oxide based on the density functional theory calculation of crystalline niobium pentoxide polymorphs
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[2]	Preparation and Characterization of NbxOy Thin Films: A Review Coatings, 2020 DOI:10.3390/coatings10121246

[3]	Structural analyses and reverse Monte Carlo modeling of niobium oxide amorphous film prepared by sputtering method Journal of the Ceramic Society of Japan, 2017 DOI:10.2109/jcersj2.17053

[4]	Investigation of electronic structure of amorphous niobium oxide based on the density functional theory calculation of crystalline niobium pentoxide polymorphs Journal of the Ceramic Society of Japan, 2016 DOI:10.2109/jcersj2.16180